Az 340 msds. Last Updated: 08/08/2024.

Az 340 msds. 21 1 Identification · Product identifier · Trade name: AZ 628 · Article number: 15336 All AZ 1500series resists are compatible with all common developers used for - positive photoresists, like AZ 340 (diluted 1:5), 0. PRODUCT AND COMPANY IDENTIFICATION Product name : AZ 340 Developer Product Use Description : Intermediate for electronic industry Company : EMD Performance Materials Corp. 0 Revision Date 05/29/2015 Print Date 05/29/2015 7 / 10 SECTION 12. 0 Revision Date 12/26/2014 Print Date 12/26/2014 1 / 13 SECTION 1. Compliance Solutions This premium-quality alkyd enamel is formulated for use in mild to moderate industrial environments. 54NA, 0. Last Updated: 08/08/2024. 3°F (0. 0 – 5. : GHSBBG705S Version 6. PHYSICAL and CHEMICAL PROPERTIES AZ 4533 AZ 4562 Solids content [%] 34. AZ ® Developer displays the lowest aluminium etch rate (it is more or less zero!) of all AZ ® Developer - types and is ideal for metal levels. MSDS: Safety Data Sheet AZ ® 400K 1:4 Developer english AZ ® EBR Solvent or AZ® EBR 70/30. 6 Revision Date: 01/28/2021 SDS Number: 1765404-00012 Date of last issue: 08/25/2020 Date of first issue: 06/21/2017 Aug 17, 2013 · MATERIAL SAFETY DATA SHEET <strong>AZ</strong> KWIK STRIP REMOVER 340-0020 Substance key: BBG703W REVISION DATE: 06/07/2005 Version 1 PRINT DATE 11/30/2005 adequate AZ® 340 Developer Inorganic Developers General Information AZ® 340 Developer is a high normality sodium based developer concentrate for use in on-site custom dilution applications. 0 – 3. ECOLOGICAL INFORMATION Data for AZ 300 MIF DEVELOPER Additional ecological information : No ecological testing was carried out on the preparation. . DEVELOPING AZ 10XT series photoresists are compatible with MIF (TMAH) or inorganic developers. MSDS: Safety Data Jun 7, 2005 · AZ Kwik Strip Remover 340-0020 Manufacturer AZ Electronic Materials Product code 18451123170 Revision date 2005 June 07 Language English. 0 – 6. MSDS: Safety Data Sheet AZ This resist series is designed for use with any common sodium and potassium based developer. Arizona law allowing for a tax credit for cash donations made to Jul 23, 2012 · Click on a date/time to view the file as it appeared at that time. 5 39. 9 Revision Date: 27. 0µm AZ P4210 2. Facebook; YouTube; Twitter; Instagram © The University of Chicago | Pritzker School of Molecular Engineering 5640 S. 3 Revision Date: 11. txt) or read online for free. Contact your AZ products representative for application/substrate specific remover recommendations and data sheets. MATERIAL SAFETY DATA SHEET AZ(R) 300 MIF DEVELOPER Substance key: BBG70N4 REVISION DATE: 07/25/2005 Version Print Date: 07/25/2005 1/6 Section 01 - Product Information Identification of the company: AZ Electronic Materials USA Corp. 5 15 16 *one sided measurements AZ® 340 Developer Inorganic Developers General Information AZ® 340 Developer is a high normality sodium based developer concentrate for use in on-site custom dilution applications. No smoking. Further Information. AZ 340 Developer Substance No. : SXR054861 Version 3. com , but for users from your part of the world, we originally designed the following web presence https://www. Compliance Solutions Connect with the PNF. Wear solvent resistant gloves, protective clothing, and eye/face protection. 1. It is an odourless, aqueous, inorganic, alkaline solution, free of phosphates. Compliance Solutions DEVELOPING Spray or immersion developing in AZ 400K series developers is recommended. IDENTIFICATION Product identifier : AZ 340 Developer Product number : 697329 Recommended use of the chemical and restrictions on use Recommended use : Materials for use in technical applications Details of the supplier of the safety data sheet AZ 340 Developer is a general purpose developer for use with almost any positive AZ Photoresist. Grade Refer to the current Material Safety Data Sheet (MSDS) for detailed information prior to handling. While AZ 1500-family and AZ 1514H are optimised for best process latitude at 50 60 seconds development time, AZ 1500HS- family performs best at - AZ 10XT, or AZ 50XT photoresist films (above 10µm) and may also be diluted for cus-tom develop rates on thinner photoresist films. 2018 SDS Number: 70MDGM697328 1 / 9 SECTION 1. 2019 SDS Number: 70MDGM697349 2 / 12 Hazard Statements : H226 Flammable liquid and vapor. AZ ® EBR Solvent 70/30 is the main solvent/thinner of almost all AZ ® and TI photoresists due to its low vapour pressure and its suppression of particle formation in the (further diluted) resist. 0µm AZ P4400 4. AZ 40XT is compatible with drain lines handling similar organic solvent based Jan 15, 2008 · AZ 4562 Photoresist Manufacturer AZ Electronic Materials Product code SXR081518 Revision date 2008 January 15 Language English. To obtain a copy of the SDS in the format required by your country's legislation, please contact your local 3M subsidiary or call 1-888-364-3577 or 1-651-737-6501 for more information. REFERENCE PROCESS (Dense lines in AZ ECI 3027 Photoresist) Process Step Parameters 2. AZ® 3300-F Series Crossover Photoresists Companion Products Wafer Prime: AZ® Adhesion Promoter Antirefl ective Coating: AZ® BARLi ® II and AZ HERBTM Bottom Antirefl ective Coatings Edge Bead Process: AZ® EBR 70/30 Edge Bead Remover Develop Cycle: AZ® 300 MIF, 917 MIF, and 726 MIF Developers Stripping: AZ® 300T and 400T Strippers > MSDS access data. 07. pdf), Text File (. sikacorp. It contains 3 bedrooms and 2 bathrooms. : 800-515-4164 Information on the substance/preparation AZ 400k developer_MSDS - Free download as PDF File (. Jul 31, 2015 · MSDS AZ 634-2 - ChemCenters. Further Information MSDS: Safety Data Sheet AZ® 400K 1:4 Developer english Sicherheitsdatenblatt AZ AZ® EBR Solvent or AZ® EBR 70/30 Developers AZ® ®400K 1:3 or 1:4, AZ 421K, AZ Developer 1:1, AZ 340 Removers AZ ® 300T, AZ 400T, AZ Kwik Strip AZ® P4000 Series Positive Tone Photoresists Grade Film Thickness Range AZ P4110 1. 5% NaOH solution and metal ion free developers like AZ 726 MIF. The AZ ® 726 MIF Developer contains additionally a surfactant for better wetting and easy to settle up of AZ EBR 70/30 Substance No. : GHSBBG70N4 Version 4. 96µm gold bump plated in AZ P4620. English Deutsch Français Español Português Italiano Român Nederlands Latina Dansk Svenska Norsk Magyar Bahasa Indonesia Türkçe MATERIAL SAFETY DATA SHEET<br /> <strong>AZ</strong> KWIK STRIP REMOVER 340-0020<br /> Substance key: BBG703W REVISION DATE: 06/07/2005<br /> Version 1 PRINT DATE 11 SDS management, distribution & revision solutions - for every budget. mnc. This document provides safety information for AZ 400K developer. AZ 10XT, or AZ 50XT photoresist films (above 10µm) and may also be diluted for cus-tom develop rates on thinner photoresist films. 0 – 4. IDENTIFICATION Product identifier : AZ Developer Product number : 697328 Recommended use of the chemical and restrictions on use Recommended use : Intermediate for electronic industry Details of the supplier of the safety data sheet AZ 340 Developer is a sodium based developer concentrate suitable for making custom dilutions with DI water to fit specific process requirements. com . When compared with a zeotrope, an azeotropic mixture such as Genetron AZ-20 will not suffer significant segregation in a system Material Safety Data Sheet Genetron® AZ-20 (R-410A) Version 2 Revision Date 11/14/2007 Print Date 11/14/2007 Page 1 / 10 SECTION 1. CoteAll is designed for new construction and maintenance applications where sheen and color retention as well as outstanding durability are desired. AZ ® 1500, AZ ® ECI3000 and AZ ® 4500 or AZ ® PL177). com 201 Polito Avenue Lyndhurst NJ AZ EBR SOLVENT Version 3. AZ Developer 1:1 may be used in applications requiring zero etch rate on Aluminum substrates. 17 18 20 22 24 Waist 15 16 18 20 22 Hip 19 20 22 24 26 Shoulder 13. AZ® 400K MIC Developer is based on buffered KOH and typically used in a 1:3 to 1:4 dilution (1 part of concentrate and 4 parts of DI-water) and can be used especially for our thicker resist types, such as AZ® 4562, AZ® 10XT, and AZ® 40XT. Use more dilute solutions for thin photoresists (to improve process control) and stronger solutions for thick photoresists to improve develop rate. 38 % TMAH (tetramethylammoniumhydroxide) in H2O. e. Further Information MSDS: Safety Data Sheet AZ® 400K 1:4 Developer english Sicherheitsdatenblatt AZ AZ ® Developer 1:1 can be used in combination with most families of AZ ® Photoresists (i. The top-ranked , STEM-designated MSDS is offered on our main campus in Tucson, Arizona and online, and can be completed in as few as 18 months. 0µm AZ P4330-RS 3. 2013 Print Date 10. P233 Keep container tightly closed. 2022 SDS Number: 70MDGM697329 1 / 12 SECTION 1. azdvs. The Rent Zestimate for this Single Family is $2,320/mo, which has increased by $2,320/mo in the last 30 days. AZ 400K 1:3 or AZ 421K (unbuffered) are recommended for resist film thicknesses above 12&micro;m. AZ 40XT contains PGMEA (1-Methoxy-2-propanol acetate). 6s) Nikon Stepper Post Expose Bake 120°C, 60 seconds, proximity hotplate Develop AZ 726MIF, 60s single puddle @ 23°C The information provided on all SDS forms is correct to the best of our knowledge, information and belief at the date of publication. PHOTORESIST: FOTOLACK: AZ® 10XT (220cps) EN: AZ® 340 Developer DE: AZ® 351B Developer EN: AZ® 351B Developer DE : AZ® 400K 1:4 Developer EN: Aug 17, 2013 · Attention! Your ePaper is waiting for publication! By publishing your document, the content will be optimally indexed by Google via AI and sorted into the right category for over 500 million ePaper readers on YUMPU. AZ 435MIF and AZ 400K 1:3 or AZ 400K 1:4 are recommended. S. Additionally, PGMEA is often used for edge bead removal, since its low MATERIAL SAFETY DATA SHEET Date Issued: 05/03/2009 MSDS No: Sikafloor 340 ESD Part C Date-Revised: 05/17/2009 Revision No: 1 1. 101 Columbia Road AZ® developers are high contrast, ultra-high purity, and formulated for a wide range of lithography applications. This home last sold for $375,000 in October 2024. Safety Data Sheets (SDS) are available below for all chemicals approved for use in the cleaanroom and are also available in hard copy in the yellow SDS binders located in the cleanroom. Further Information MSDS: Safety Data Sheet AZ® 400K 1:4 Developer english Sicherheitsdatenblatt AZ AZ Developer Version 4. Under normal process conditions, AZ 1500 strips readily in removers designed for DNQ/novolac type photoresists. Apr 4, 2015 · Az Ebr 70/30 Manufacturer EMDPerformance Materials Corp Product code 70/30, 000000500444 Revision date 2015 April 04 Language English. AZ 421K is compatible with most thick DNQ type photoresists. It recommends personal protective equipment like safety eyewear and gloves when handling this product. It lists potassium borates and potassium hydroxide as hazardous ingredients. Compliance Solutions Oct 21, 2024 · 340 Via Capri, Rio Rico AZ, is a Single Family home that contains 2247 sq ft and was built in 2006. AZ 300T, AZ 400T, and AZ Kwik Strip removers are recommended. emdgroup. Refer to the current version of the MSDS and to local regulations for up to date information on safe handling and proper disposal. 26N developer formulated to improve photo speed in puddle or immersion develop processes with no loss of contrast or selectivity. 2 Relevant identified uses of the substance or mixture and uses advised against Use of the AZ ® EBR Solvent 70/30 1-methoxy-2-propyl-acetate . : 000000500444 Version 44 Revision Date 10. M. Aug 25, 2020 · SAFETY DATA SHEET Krytox™ 240AZ Version 6. H336 May cause drowsiness or dizziness. 5µm thick AZ ECI 3027 on bare Si Soft Bake 100°C, 60 seconds, proximity hotplate Exposure i-line @ 262mJ/cm2 nominal* (0. 10. 12. Further Information MSDS: Safety Data Sheet AZ® 400K 1:4 Developer english Sicherheitsdatenblatt AZ Mar 11, 2009 · AZ Aquatar-VIII-A 30-1G Manufacturer AZ Electronic Materials (Japan) Product code 000000202591 Revision date 2009 March 11 Language English. AZ Kwik Strip Remover (US) Material: Double Georgette Length: 48 inches _____SIZE CHART_____ Sizes. 0µm AZ P4620 6. The Zestimate for this Single Family is $381,300, which has increased by $381,300 in the last 30 days. 26N TMAH developer optimized for puddle develop processes. Further Information MSDS: Safety Data Sheet AZ® 340 Developer english Sicherheitsdatenblatt AZ® 340 Developer german TDS: Technical Data Sheet AZ® 340 Developer english Application Notes: Development of Photoresist english Entwicklung von Fotolack german Aug 8, 2024 · Chemicals Approved for Use in UDNF . AZ 917MIF Developer AZ 917 MIF is a surfactant enhanced 0. AZ 340, 1:5 diluted with water is a good choice, AZ 400K may be used as well. AZ 400K 1:4 provides improved developer selectivity for thinner films. 2 Revision Date: 17. In addition to the concentrate, a pre-diluted AZ ® 400K 1:4 version is now also available, other dilution Page 1/9 Safety Data Sheet acc. 86 1. L. merckgroup. Cyanide electro-plating solution. Xs. Genetron AZ-20 exhibits azeotropic behavior with temperature glides that are less than 0. 2°C) over the operating range. This developer concentrate is buffered for extended bath life and stable develop rates in batch processes. PRODUCT AND COMPANY IDENTIFICATION PRODUCT DESCRIPTION: Sikafloor 340 ESD Part C PRODUCT CODE: Sikafloor 340 ESD Part C MANUFACTURER SUPPLIER Sika Corporation, Operations www. 0 - >20µm* AZ ® 400K MIC is based on buffered KOH and typically used in a 1:3 to 1:4 dilution (1 part of concentrate and 4 parts of DI-water) and can be used especially for our thicker resist types, such as AZ ® 4562, AZ ® 10XT, and AZ ® 40XT. AZ 40XT-11D Photoresist Manufacturer AZ Electronic Materials Of Clariant Corp Product code 000000502236 Revision date 2011 October 09 Language English SAFETY DATA SHEET 40 Volume Clear Developer 1" " Product(Name: 40 Volume Clear Developer Date: 7/21/2015 SECTION 1 IDENTIFICATION Supplier:(Divina Professional Products ( ( ( Distributor:((( The University of Arizona Master of Science in Data Science (MSDS) prepares students for robust careers in one of the world's fastest-growing professions. AZ ® Developer can be used in combination with most families of AZ ® Photoresists (i. An affiliate of Merck KGaA, Darmstadt Germany AZ ® 400K MIC Developer is based on buffered KOH and typically used in a 1:3 to 1:4 dilution (1 part of concentrate and 4 parts of DI-water) and can be used especially for our thicker resist types, such as AZ ® 4562, AZ ® 10XT, and AZ ® 40XT. 5 million safety data sheets available online, brought to you by 3E. An affiliate of Merck KGaA, Darmstadt Germany See full list on apps. 0 Revision Date 05/21/2015 Print Date 05/21/2015 8 / 16 Result: Severe eye irritation Classification: Risk of serious damage to eyes. AZ ® Developer 1:1 displays the lowest aluminium etch rate (it is more or less zero!) of all AZ ® Developer 1:1 types and is ideal for metal levels. General Instructions NOTE: mustYou also complete Arizona Form 301, Nonrefundable Individual Tax Credits and Recapture, and include Forms 301 and 340 with your tax return to claim this credit. AZ 340 Developer AZ 340 Developer is a high normality sodium based developer concentrate for use in on-site custom dilution applications. Xl Chest. It is compatible with batch and in-line spray-developing processes. edu AZ 340 Developer Version 1. • Development AZ® 300MIF 4 x 60sec • Remover Bath 80°C / 5min soak REMOVAL OF AZ® 3DT PHOTORESIST • Substrate 8” Silicon • Film Tks 12. Improves photo speed by 10-20% vs. 01 AZ 340 Developer Substance No. Date/Time Dimensions User Comment; current: 16:54, 23 July 2012 (176 KB) Zwarburg (talk | contribs) {{MSDS}} AZ MIR 701 RESIST (11CPS) Substance No. 1 Product identifier Trade name : AZ EBR 70/30 1. 6 μm • Exposure i-line 400 mJ/cm2 • Soft Bake 110°C/300sec • PEB none • Development AZ® 300MIF 2 x 60sec • Remover Bath 80°C / 5min soak REMOVAL OF AZ® NLOF2070 PHOTORESIST AZ ® 300 MIF, AZ ® 326 MIF, AZ ® 726 MIF and AZ ® 2026 MIF Developers are developer formulations with 2. Free access to more than 4. umn. Higher normality (less dilute) developers will improve photospeed but Genetron AZ-20 is a 50/50 (wt. gov. 70 Meister Avenue Somerville, NJ 08876 Telephone No. AZ 300 MIF DEVELOPER Substance No. AZ ® Developer, 400K, and 421K Inorganic Developers Page 4 of 4 n The information contained herein is, to the best of our knowledge, true and accurate, but all recommendations or suggestions are made without guarantee because the conditions of AZ® 400K MIC Developer is based on buffered KOH and typically used in a 1:3 to 1:4 dilution (1 part of concentrate and 4 parts of DI-water) and can be used especially for our thicker resist types, such as AZ® 4562, AZ® 10XT, and AZ® 40XT. Source : Supplier MSDS Repeated dose toxicity : Species: Rats Application Route: Inhalation Exposure time: (28 d) Number of exposures: Daily AZ 10XT is sensitive to exposure energy in the 365-435nm wavelength range. Ellis Avenue, Chicago, IL Jul 30, 2012 · AZ Electronic Materials Of Clariant Corp Product code 10064823164, 000000500444 Revision date 2012 July 30 Language English. Developers AZ ® 400K 1:3 or 1:4, AZ ® 421K, AZ Developer 1:1, AZ 340 . EN. Data for 25% Tetramethylammonium hydroxide solution (75-59-2) Safety Data Sheets (SDS) on this web site may not meet the requirements set forth by your country's legislation. to OSHA HCS Printing date 09/06/2022 Revision date 09/06/2022 53. 2013 1 / 14 SECTION 1: Identification of the substance/mixture and of the company/undertaking 1. PRODUCT AND COMPANY IDENTIFICATION Product name : Genetron® AZ-20 (R-410A) MSDS Number : 000000009881 Product Use Description : Refrigerant Company : Honeywell International, Inc. AZ 726MIF. The information given is designed only as a guide for safe handling, use, processing, storage, transportation, disposal and release and is not to be considered as a warranty or quality specification. AZ 726MIF Developer AZ 726MIF is a surfactant enhanced 0. POST EXPOSE BAKE A PEB is optional for AZ 10XT. %) mixture of HFC-32/125. Precautionary Statements : Prevention: P210 Keep away from heat/ sparks/ open flames/ hot surfaces. It was designed to achieve utmost contrast and best wall profile. the Arizona Department of Veterans’ Services (ADVS) website at www. Removers AZ ® 300T, AZ ® 400T, AZ Kwik Strip. 5 14 14. 5 Viscosity [cSt at 25°C] 125 440 Absorptivity [l/g*cm] at 398nm 0. Redirect You have accessed https://www. 04. General Information. kllxo xves mbqmqk zdin khldgsy ucvasl uvol xgygxx wyujmaq nuy